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This section provides an overview of the dielectric and applied conductive materials used in microvia and via filling. Some of these materials can be used in both IC chip carrier and PWB HDI applications. The discussions are focused on the HDI PWB arena and on materials for which information is readily available. In section 22.5.2, cross-references are made to the relevant material specifications of the IPC/JPCA-4104 specification for HDI and microvia materials. A brief material roadmap discussion is included to illustrate material property trends. Figure 22.7 shows the compatibility of laser via, photovia, and plasma via methods with four basic surface dielectric structures on which microvia holes are to be formed. Although laser via methods can cope with all four dielectric structures, photovia and plasma via methods are applicable to only one structure, respectively, as shown in the figure. This is one reason why laser via is more widely used today. Another wiring layer is built over the existing microvia holes, which become buried via holes (BVHs).

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FIGURE 22.7 Compatibility of via hole formation methods with four basic dielectric layer structures.

The specification IPC-4104 will define material requirements for HDI applications. This IPC specification applies only to the surface HDI layers, the conventional multilayer core materials are covered by IPC specification IPC-4101B.

Dielectric Format Coated Foil Reinforced Unreinforced Conventional Reinforced Laminate Woven Non-woven Liquid Photoimageable Non-photoimageable Dry Film Photoimageable Non-photoimageable

Material and technology choices for SBU fabrication. (Courtesy of DuPont.)

Materials for HDI Microvia Fabrication Figure 22.8 shows a material and technology selection flowchart for use when choosing dielectric materials. In using the flowchart, you should ask the following questions regarding the dielectric you are considering:

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Will the dielectric use chemistry compatible with current chemistry used by core substrate material Will the dielectric have acceptable plated copper adhesion (Many original equipment manufacturers [OEMs] want 6 lb/in [1.08 kgm/cm] per 1 oz. [35.6 mm] copper.) Will the dielectric provide adequate and reliable dielectric spacing between metal layers Will it meet thermal needs Will the dielectric provide a desirable high Tg for wire bonding and rework Will it survive thermal shock with multiple SBU layers (i.e., solder floats, accelerated thermal cycles, multiple reflows) Will it have platable, reliable microvias (that is, will it have latitude to ensure good plating to the bottom of the via)

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22.5.1.1 Copper-Clad Dielectric Materials. Due to relative ease of implementation, copperclad dielectrics are used on a larger scale than unclad dielectrics. Copper-clad dielectrics provide a method that requires the least number of changes in manufacturing flow because they typically use the same dielectric and reinforcements found in standard PWBs. Copper-clad-based materials have a longer history in making blind vias than any other method. This makes many designers, OEMs, and PWB fabricators more comfortable with copper-clad-based materials. These materials can be nonreinforced or reinforced. The reinforcement can be woven or non-woven and can be aramid, glass, and so on.These dielectrics are suitable for via formation by laser or other mechanical removal methods.

Due to its wide availability and familiarity, FR-4 material is often initially evaluated in laser-drilling microvias Reinforced with thin 106 or 1080 woven glass (since thicker glass is more difficult to vaporize with lasers, but there is 1086 uniform-woven glass just for laser ablation), one- or two-ply laminates are selected with a resin content close to 70 percent The laser drilling is done by ablation of the via using a conformal mask or a directly focused beam, with either an ultraviolet (UV) Nd:YAG or a CO2 laser These materials may also be coated on a copper foil Typical applications use single-side clad material where the copper clad is used as the outer layer and the C stage is bonded to the subcomposite These materials are suitable for via formation using methods such as plasma or laser To meet fine circuitry and smaller via needs, very thin copper is available.

Another approach, practiced by many Asian PWB fabricators, is to thin down incoming copper clad by etching and/or planarizing the copper surface precisely 22512 Unclad Dielectric Materials If the dielectric is reinforced, microvias are formed by laser drilling or other mechanical means If it is nonreinforced, it can be photoimageable in addition to the previous choices To add conductivity, subtractive processing is the standard manufacturing practice in the United States and Europe Semi- or fully additive techniques have been practiced in continuous high volume only in Asia, most notably Japan In Japan, which leads the world in microvia production, about 22 percent of manufacturing begins with a non-copper-clad dielectric material Japan has long accepted the additive manufacturing methodology for creating circuits on the board surface as well as the through-hole connection.

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